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- W4311191307 abstract "Commonly used melamine formaldehyde micro-particles exposed to an rf discharge are known to be etched by a plasma as soon as an admixture of oxygen is present. By means of in situ high precision size measurements, the plasma–surface interaction is investigated. A comparison of experimental data, advanced Mie-scattering techniques, and a reaction rate model allows, for the first time, to quantitatively describe the etch process." @default.
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- W4311191307 date "2022-12-01" @default.
- W4311191307 modified "2023-09-28" @default.
- W4311191307 title "Non-linear etch process of MF particles embedded in an rf plasma with oxygen admixture" @default.
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- W4311191307 doi "https://doi.org/10.1063/5.0129509" @default.
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