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• W4311208712 abstract "Crystalline sesquioxide films (Sc₂O₃, Y₂O₃, Lu₂O₃) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO₂, HfO₂, Nb₂O₅). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO₂ in the multi-pulse test regime. The results are the basis for designs of damage resistant re ective components used in ultrashort-pulse lasers." @default.
• W4311208712 created "2022-12-24" @default.
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• W4311208712 date "2022-12-02" @default.
• W4311208712 modified "2023-10-18" @default.
• W4311208712 title "Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings" @default.
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• W4311208712 doi "https://doi.org/10.1117/12.2641792" @default.
• W4311208712 hasPublicationYear "2022" @default.
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