Matches in SemOpenAlex for { <https://semopenalex.org/work/W4311557671> ?p ?o ?g. }
Showing items 1 to 73 of
73
with 100 items per page.
- W4311557671 abstract "Fused silica glass is a material of choice for micromechanical, microfluidic, and optical devices due to its ultimate chemical resistance, optical, electrical, and mechanical performance. Wet etching in hydrofluoric solutions especially a buffered oxide etching (BOE) solution is still the key method for fabricating fused silica glass-based microdevices. It is well known that protective mask integrity during deep fused silica wet etching is a big challenge due to chemical stability of fused glass and extremely aggressive BOE properties. Here, we propose a multilevel fused silica glass microstructures fabrication route based on deep wet etching through a stepped mask with just a one grayscale photolithography step. First, we provide a deep comprehensive analysis of a fused quartz dissolution mechanism in BOE solution and calculate the main fluoride fractions like $HF^-_2$, $F^-$, $(HF)_2$ components in a BOE solution as a function of pH and $NH_4F:HF$ ratio at room temperature. Then, we experimentally investigate the influence of BOE concentration ($NH_4F:HF$ from 1:1 to 14:1) on the mask resistance, etch rate and profile isotropy during fused silica 60 minutes etching through a metal/photoresist mask. Finally, we demonstrate a high-quality multilevel over-200 um isotropic wet etching process with the rate up to 3 um/min, which could be of a great interest for advanced fused silica microdevices with flexure suspensions, inertial masses, microchannels, and through-wafer holes." @default.
- W4311557671 created "2022-12-27" @default.
- W4311557671 creator A5002093541 @default.
- W4311557671 creator A5015175148 @default.
- W4311557671 creator A5034415722 @default.
- W4311557671 creator A5040309513 @default.
- W4311557671 creator A5043656053 @default.
- W4311557671 creator A5047552668 @default.
- W4311557671 creator A5050068569 @default.
- W4311557671 creator A5063738149 @default.
- W4311557671 creator A5073219104 @default.
- W4311557671 creator A5079658913 @default.
- W4311557671 creator A5089357132 @default.
- W4311557671 date "2022-12-13" @default.
- W4311557671 modified "2023-09-26" @default.
- W4311557671 title "Deep multilevel wet etching of fused silica glass microstructures in BOE solution" @default.
- W4311557671 doi "https://doi.org/10.48550/arxiv.2212.06699" @default.
- W4311557671 hasPublicationYear "2022" @default.
- W4311557671 type Work @default.
- W4311557671 citedByCount "0" @default.
- W4311557671 crossrefType "posted-content" @default.
- W4311557671 hasAuthorship W4311557671A5002093541 @default.
- W4311557671 hasAuthorship W4311557671A5015175148 @default.
- W4311557671 hasAuthorship W4311557671A5034415722 @default.
- W4311557671 hasAuthorship W4311557671A5040309513 @default.
- W4311557671 hasAuthorship W4311557671A5043656053 @default.
- W4311557671 hasAuthorship W4311557671A5047552668 @default.
- W4311557671 hasAuthorship W4311557671A5050068569 @default.
- W4311557671 hasAuthorship W4311557671A5063738149 @default.
- W4311557671 hasAuthorship W4311557671A5073219104 @default.
- W4311557671 hasAuthorship W4311557671A5079658913 @default.
- W4311557671 hasAuthorship W4311557671A5089357132 @default.
- W4311557671 hasBestOaLocation W43115576711 @default.
- W4311557671 hasConcept C100460472 @default.
- W4311557671 hasConcept C105487726 @default.
- W4311557671 hasConcept C1291036 @default.
- W4311557671 hasConcept C134406635 @default.
- W4311557671 hasConcept C159985019 @default.
- W4311557671 hasConcept C160671074 @default.
- W4311557671 hasConcept C171250308 @default.
- W4311557671 hasConcept C191897082 @default.
- W4311557671 hasConcept C192562407 @default.
- W4311557671 hasConcept C2776967294 @default.
- W4311557671 hasConcept C2779227376 @default.
- W4311557671 hasConcept C33220542 @default.
- W4311557671 hasConceptScore W4311557671C100460472 @default.
- W4311557671 hasConceptScore W4311557671C105487726 @default.
- W4311557671 hasConceptScore W4311557671C1291036 @default.
- W4311557671 hasConceptScore W4311557671C134406635 @default.
- W4311557671 hasConceptScore W4311557671C159985019 @default.
- W4311557671 hasConceptScore W4311557671C160671074 @default.
- W4311557671 hasConceptScore W4311557671C171250308 @default.
- W4311557671 hasConceptScore W4311557671C191897082 @default.
- W4311557671 hasConceptScore W4311557671C192562407 @default.
- W4311557671 hasConceptScore W4311557671C2776967294 @default.
- W4311557671 hasConceptScore W4311557671C2779227376 @default.
- W4311557671 hasConceptScore W4311557671C33220542 @default.
- W4311557671 hasLocation W43115576711 @default.
- W4311557671 hasOpenAccess W4311557671 @default.
- W4311557671 hasPrimaryLocation W43115576711 @default.
- W4311557671 hasRelatedWork W1966895858 @default.
- W4311557671 hasRelatedWork W1985330728 @default.
- W4311557671 hasRelatedWork W1991785538 @default.
- W4311557671 hasRelatedWork W2035783828 @default.
- W4311557671 hasRelatedWork W2064757351 @default.
- W4311557671 hasRelatedWork W2325894594 @default.
- W4311557671 hasRelatedWork W2551637397 @default.
- W4311557671 hasRelatedWork W2765629030 @default.
- W4311557671 hasRelatedWork W3021887777 @default.
- W4311557671 hasRelatedWork W62896366 @default.
- W4311557671 isParatext "false" @default.
- W4311557671 isRetracted "false" @default.
- W4311557671 workType "article" @default.