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• W4311882619 abstract "Chromium‐doped titanium nitride thin films are deposited using RF/DC reactive magnetron co‐sputtering technique. Optical, chemical, surface morphology and magnetic properties of the deposited films are studied using spectrophotometry, X‐ray photoelectron spectroscopy, atomic force microscopy, and vibrating sample magnetometry, respectively. Films are prepared with different concentration of chromium by adjusting the sputtering power of magnetron using chromium target. A redshift in the bandgap of Cr‐TiN films is observed as a function of chromium concentration. X‐ray photoelectron spectroscopy confirms the presence of chromium in the films in third (Cr +3 ) and sixth (Cr +6 ) oxidation state. The films with lower concentration of chromium exhibit ferromagnetism with clear hysteresis loop at 3 K and at room temperature with higher saturation magnetization compared to the films grown with higher Cr concentration." @default.
• W4311882619 created "2023-01-02" @default.
• W4311882619 creator A5009964376 @default.
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• W4311882619 date "2023-01-29" @default.
• W4311882619 modified "2023-09-26" @default.
• W4311882619 title "Effect of Cr Concentration on the Optical and Magnetic Properties of Cr‐TiN Thin Films Grown by Reactive Magnetron Sputtering" @default.
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• W4311882619 doi "https://doi.org/10.1002/pssa.202200544" @default.
• W4311882619 hasPublicationYear "2023" @default.
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