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• W4312651530 endingPage "A0114" @default.
• W4312651530 startingPage "A0114" @default.
• W4312651530 abstract "Among the various types of cluster secondary ion mass spectrometry (SIMS), electrospray droplet impact/secondary ion mass spectrometry (EDI/SIMS) is unique due to its high ionization efficiency and non-selective atomic/molecular-level surface etching ability. In this study, EDI/SIMS was applied to the non-selective etching of synthetic polymers of polystyrene (PS) and poly(9,9-di-n-octylfluonyl-2,7diyl) (PFO) deposited on a silicon substrate. The polymers gave characteristic fragment ions and the mass spectra remained unchanged with prolonged EDI irradiation time, indicating that non-selective etching can be achieved by EDI irradiation, a finding that is consistent with our previous reports based on EDI/X-ray photoelectron spectroscopy analyses. From the irradiation time and film thickness, the etching rates for PS and PFO were roughly estimated to be 0.6 nm/min and 0.15 nm/min, respectively, under the experimental conditions that were used. After the depletion of polymer sample on the surface, ion signals originating from the exposed silicon substrate were observed. This indicates that EDI/SIMS is applicable to the analysis of the interface of multilayered films composed of organic and inorganic materials." @default.
• W4312651530 created "2023-01-05" @default.
• W4312651530 creator A5056531353 @default.
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• W4312651530 date "2023-01-31" @default.
• W4312651530 modified "2023-10-14" @default.
• W4312651530 title "An Investigation of the Non-selective Etching of Synthetic Polymers by Electrospray Droplet Impact/Secondary Ion Mass Spectrometry (EDI/SIMS)" @default.
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• W4312651530 doi "https://doi.org/10.5702/massspectrometry.a0114" @default.
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• W4312651530 hasPublicationYear "2023" @default.
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