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- W4313404218 abstract "Abstract Formation of an ultra-thin nickel-germanide (Ni-germanide) film on a SiO 2 film has been attempted with stacking structures of Ni with various thicknesses formed on Ge films with thicknesses of 4 nm or 20 nm and annealing in an N 2 ambient condition. Physical analyses revealed that the ultra-thin Ni-germanide films with smooth surfaces could be formed on the SiO 2 film after annealing at 400 °C without depending on the Ni thickness on the 4 nm thick Ge films. In the formation, reductive and oxidative reactions occurred in the films, which are quite important for determining a composition of the Ni-germanide." @default.
- W4313404218 created "2023-01-06" @default.
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- W4313404218 date "2023-01-23" @default.
- W4313404218 modified "2023-09-25" @default.
- W4313404218 title "Formation of ultra-thin NiGe film with single crystalline phase and smooth surface" @default.
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- W4313404218 doi "https://doi.org/10.35848/1347-4065/acac6f" @default.
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