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- W4313446035 abstract "Surface analysis techniques such as X-ray Photoelectron Spectroscopy (XPS), Auger Electron Spectroscopy (AES) and Time-of-Flight Secondary Ion Mass Spectrometry (TOF SIMS) are routinely used in materials’ and process characterization as well as tools for failure analysis. Very often the identification of particles is of great importance in various manufacturing and semiconductor technologies in order to determine the source of the particulate contamination, which leads to product failures. XPS provides chemical and elemental identification of particles, with its major limitation being a spatial resolution of about 10 μm. Auger electron spectroscopy with its high surface sensitivity and small analysis volume makes it the technique of choice for the characterization of sub-micrometer inorganic particles. In the case of examining small particles in an organic matrix, TOF SIMS is the technique of choice. In today’s complex manufacturing processing environment all of these surface analysis techniques are commonly used for solving problems related to particles. Analysis and identification of particles found during manufacturing processing by the application of these surface analysis techniques is reviewed." @default.
- W4313446035 created "2023-01-06" @default.
- W4313446035 creator A5085364183 @default.
- W4313446035 date "2023-01-03" @default.
- W4313446035 modified "2023-09-23" @default.
- W4313446035 title "Applying surface analysis techniques for particle identification" @default.
- W4313446035 doi "https://doi.org/10.1201/9780429070716-2" @default.
- W4313446035 hasPublicationYear "2023" @default.
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