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- W4313446040 abstract "SC1 (a mixture of DI water, H2O2 and NH4OH) is one of the chemical solutions used for particle removal from silicon wafer surfaces. Valtron SP2200 surfactant is a water-soluble alkaline detergent with a unique blend of anionic and nonionic surfactants. This study shows that addition of Valtron SP2200 surfactant into the SC1 solution enhances the capability of particle removal at 0.09 μm or larger particle size without creating any new problems. The co-injection process was carried out on Mattson OMNI™ 8100 system, which is a single, stationary and closed chamber system for semiconductor wet cleaning." @default.
- W4313446040 created "2023-01-06" @default.
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- W4313446040 date "2023-01-03" @default.
- W4313446040 modified "2023-09-23" @default.
- W4313446040 title "The enhancement of particle removal by adding Valtron SP2200 surfactant into SC1 solution" @default.
- W4313446040 doi "https://doi.org/10.1201/9780429070716-28" @default.
- W4313446040 hasPublicationYear "2023" @default.
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