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- W4313491145 abstract "The use of two (or more) radio frequency (RF) sources at different frequencies is a common technique in the plasma processing industry to control ion energy characteristics separately from plasma generation. A similar approach is presented here with the focus on modifying the electron population in argon and helium plasmas. The plasma is generated by a helicon source at a frequency f0 = 13.56 MHz. Microwaves of frequency f1 = 2.45 GHz are then injected into the helicon source chamber perpendicular to the background magnetic field. The microwaves damp on the electrons via R-mode (anti-parallel to the background magnetic field B0) and Xmode (perpendicular to B0) Electron Cyclotron Resonance (ECR) heating, providing additional energy input into the electrons. The effects of this secondary-source heating on electron density, temperature, and energy distribution function are examined and compared to helicon-only single source plasmas as well as numerical models suggesting that the heating is not evenly distributed but spatially localized. Optical Emission Spectroscopy (OES) is used to examine the impact of the energetic tail of the electron distribution on ion and neutral species via collisional excitation. Large enhancements of neutral spectral lines are observed with little to no enhancement of ion lines via X-mode ECR heating while R-mode damping shows significant enhancement of ion line emission." @default.
- W4313491145 created "2023-01-06" @default.
- W4313491145 creator A5073860489 @default.
- W4313491145 date "2023-01-04" @default.
- W4313491145 modified "2023-10-01" @default.
- W4313491145 title "Microwave Enhanced Electron Energy Distribution Functions" @default.
- W4313491145 doi "https://doi.org/10.33915/etd.11519" @default.
- W4313491145 hasPublicationYear "2023" @default.
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