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• W4313592021 abstract "Abstract We report several effects found in reactive bipolar high-power impulse magnetron sputtering (abbreviated as bipolar HiPIMS or BPH) discharges at the substrate level. The role of the negative peak current and the positive pulse voltage, U <?CDATA $_+$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi> </mml:mi> <mml:mo>+</mml:mo> </mml:msub> </mml:math> , on the deposition flux at the electrically insulating substrate is discussed and the results are compared to conventional DC discharges. In particular, the normalized energy flux, ϕ n , delivered to the substrate is found higher under BPH conditions at U <?CDATA $_+$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi /> <mml:mo>+</mml:mo> </mml:msub> </mml:math> = +300 V ( <?CDATA $varphi_n = 3.43times10^{15}$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi>φ</mml:mi> <mml:mi>n</mml:mi> </mml:msub> <mml:mo>=</mml:mo> <mml:mn>3.43</mml:mn> <mml:mo>×</mml:mo> <mml:msup> <mml:mn>10</mml:mn> <mml:mrow> <mml:mn>15</mml:mn> </mml:mrow> </mml:msup> </mml:math> eV·nm −3 ) as compared to the HiPIMS ( <?CDATA $varphi_n = 0.78times10^{15}$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi>φ</mml:mi> <mml:mi>n</mml:mi> </mml:msub> <mml:mo>=</mml:mo> <mml:mn>0.78</mml:mn> <mml:mo>×</mml:mo> <mml:msup> <mml:mn>10</mml:mn> <mml:mrow> <mml:mn>15</mml:mn> </mml:mrow> </mml:msup> </mml:math> eV·nm −3 ) and DCMS ( <?CDATA $varphi_n = 1.23times10^{15}$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi>φ</mml:mi> <mml:mi>n</mml:mi> </mml:msub> <mml:mo>=</mml:mo> <mml:mn>1.23</mml:mn> <mml:mo>×</mml:mo> <mml:msup> <mml:mn>10</mml:mn> <mml:mrow> <mml:mn>15</mml:mn> </mml:mrow> </mml:msup> </mml:math> eV·nm −3 ) regimes which is assumed to be provoked by an intensification of the positive ion bombardment. Accordingly, the mean energy and the count of positively charged metal and gaseous ions increase in line with U <?CDATA $_+$?> <mml:math xmlns:mml=http://www.w3.org/1998/Math/MathML overflow=scroll> <mml:msub> <mml:mi /> <mml:mo>+</mml:mo> </mml:msub> </mml:math> as measured by energy-resolved mass spectrometry. Contrariwise, our analysis has shown a significant decrease (≈20 %) of negative oxygen ion count under BPH conditions." @default.
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• W4313592021 date "2023-01-25" @default.
• W4313592021 modified "2023-09-25" @default.
• W4313592021 title "Insights on film growth conditions on a floating substrate during reactive Ar/O₂ bipolar high power impulse magnetron sputter deposition" @default.
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• W4313592021 doi "https://doi.org/10.1088/1361-6463/acaff4" @default.
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