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• W4315475858 abstract "Routes to area- and especially site-selective atomic layer deposition (ALD) remain an enticing challenge in precision surface science, despite the potentially game-changing capability for many energy applications. An unparalleled level of surface reaction control is required to direct ALD to select sites on the same nominal material, for example, targeted growth on distinct phases, facets, step-edges, and/or defects. However, as a sequential surface synthesis method, ALD is uniquely suited to these challenges, including the possibility of selective deposition at defective surface atom arrangements. We computationally identify conditions for site-selective ALD through hydration of surface defects, including oxygen vacancies and titanium interstitials on low-index rutile TiO2 facets. First-principles computation is used to predict, as a function of temperature, the hydroxylation of defects that are targeted by proton-exchange-mediated ALD processes. In situ ellipsometric measurements of ALD Al2O3 nucleation on TiO2 (110) single crystals prepared with and without abundant oxygen vacancies demonstrate striking contrast, corroborating computational predictions and revealing a mechanistically clear path to site-selective ALD." @default.
• W4315475858 created "2023-01-11" @default.
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• W4315475858 date "2023-01-10" @default.
• W4315475858 modified "2023-10-17" @default.
• W4315475858 title "Site-Selective Atomic Layer Deposition on Rutile TiO₂: Selective Hydration as a Route to Target Point Defects" @default.
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• W4315475858 doi "https://doi.org/10.1021/acs.jpcc.2c06992" @default.
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