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- W4318447355 abstract "Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is one of the most widely studied block copolymers for direct self-assembly because of its excellent compatibility with traditional processes. However, pattern transfer of PS-b-PMMA block copolymers (BCPs) remains a great challenge for its applications due to the insufficient etching resolution. In this study, the effect of ionic liquid 1-hexyl-3-methylimidazolium hexafluorophosphate (HMHF) additives on the line edge roughness (LER) performances of PS-b-PMMA self-assembled patterns was studied. Trace addition of HMHF kept the photolithography compatibility of PS-b-PMMA block copolymer films, but obviously increased their Flory-Huggins interaction parameter (χ) and enabled phase separation of disordered low molecular weight BCPs. LER value was effectively decreased by blending HMHF directly with PS-b-PMMA or from a supplying top layer of polyvinylpyrrolidone containing HMHF additives. This study shows an excellent strategy to improve the deficiencies of existing block copolymers." @default.
- W4318447355 created "2023-01-30" @default.
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- W4318447355 date "2023-03-06" @default.
- W4318447355 modified "2023-10-14" @default.
- W4318447355 title "Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives" @default.
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- W4318447355 doi "https://doi.org/10.1088/1361-6528/acb6df" @default.
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