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- W4320063677 abstract "We have investigated the initial stages of dielectric breakdown in high-field stressed low-k dielectric (SiOC:H) capacitor structures. Our study makes use of electrically detected magnetic resonance (EDMR) via spin-dependent trap-assisted tunneling (SDTAT). We find at least two distinct stages precede the breakdown of the dielectrics: a very fast initial stage associated with an overall decrease in leakage current and a rapid generation of Si dangling bonds, and a much slower subsequent intermediate stage associated with an overall recovery of leakage current with little further Si dangling bond trap generation. The generation of these Si dangling bonds early-on in the device’s lifetime seems to be associated with the initial decrease in conductance very early in device lifetimes observed in previous electrical studies." @default.
- W4320063677 created "2023-02-12" @default.
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- W4320063677 date "2022-10-09" @default.
- W4320063677 modified "2023-09-29" @default.
- W4320063677 title "Electrically Detected Magnetic Resonance Study of High-Field Stressing in SiOC:H Films" @default.
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- W4320063677 doi "https://doi.org/10.1109/iirw56459.2022.10032735" @default.
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