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• W4322102259 abstract "We compare the effect of two synthesis methods namely Chemical Vapor Deposition (CVD) and Ultrasonic Nebulized Spray Pyrolysis of Aqueous Combustion Mixture (UNSPACM) on the Semiconductor-Metal Transition (SMT) characteristics of VO2 thin films. The SMT characteristics of the films are measured electrically and optically. CVD films show a lower resistance ratio and SMT strength, whereas films synthesized via UNSPACM are rougher. We ascribe the reason for the observed behaviour to morphology and off-stoichiometry arising from the deposition process." @default.
• W4322102259 created "2023-02-26" @default.
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• W4322102259 date "2023-05-01" @default.
• W4322102259 modified "2023-09-27" @default.
• W4322102259 title "Comparing the effect of synthesis techniques on the semiconductor-metal transition of VO2 thin films" @default.
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• W4322102259 doi "https://doi.org/10.1016/j.matlet.2023.134108" @default.
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