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- W4327727608 abstract "The possibility of using reagent-free modified water for preparing the GaAs surface in the process of creating microstrip structures with Au-GaAs contacts has been studied. It is shown that, compared with the well-known technique based on the use of deionized water, it is possible to significantly improve the quality of both rectifying and non-rectifying (ohmic) contacts obtained by the thermal evaporation of metals in vacuum. This is achieved by creating a layer of recrystallized gallium arsenide instead of a thin layer of natural oxide at the metal-semiconductor interface." @default.
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- W4327727608 date "2023-03-01" @default.
- W4327727608 modified "2023-09-30" @default.
- W4327727608 title "Au-GaAs interface formation during the thermal evaporation of gold in vacuum" @default.
- W4327727608 doi "https://doi.org/10.30898/1684-1719.2023.3.2" @default.
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