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- W4327915440 abstract "The technical of realizing full-color display by monochromatic integrated 100 × 100 blue Micro-LED array exciting InP quantum dot color conversion layer is researched in this study. Using photolithography technology to prepare color film on a separate glass cover glass has the advantages of better accuracy and display resolution. The optimum thickness 12 μ m of the quantum dot photoresist (QDPR) was verified and 10 μ m black matrix (BM) was proposed to reduce the light crosstalk between different sub-pixels. The thickness of color filter 1 ± 0.4 μ m was made successfully between the QDPR and the cover glass, which can greatly can significantly increase the display color gamut from 78.7% to 100.8% NTSC. The red and green brightness conversion efficiency reach up to 78.1% and 296.5% respectively. Representative RGB monochromatic pictures with 100% high yield were displayed successfully." @default.
- W4327915440 created "2023-03-21" @default.
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- W4327915440 date "2023-04-01" @default.
- W4327915440 modified "2023-09-30" @default.
- W4327915440 title "Application of InP Quantum Dot film by Photolithography Technology on a Micro-LED Display" @default.
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- W4327915440 doi "https://doi.org/10.1149/2162-8777/acc5b0" @default.
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