Matches in SemOpenAlex for { <https://semopenalex.org/work/W4328050489> ?p ?o ?g. }
- W4328050489 endingPage "12182" @default.
- W4328050489 startingPage "12173" @default.
- W4328050489 abstract "A novel molecular glass (TPSiS) with photoacid generator (sulfonium salt group) binding to tetraphenylsilane derivatives was synthesized and characterized. The physical properties such as solubility, film-forming ability, and thermal stability of TPSiS were examined to assess the suitability for application as a candidate for photoresist materials. The sulfonium salt unit underwent photolysis to effectively generate photoacid on UV irradiation, which catalyzed the deprotection of the t-butyloxycarbonyl groups. It demonstrates that the TPSiS can be used as a 'single-component' molecular resist without any additives. The lithographic performance of the TPSiS resist was evaluated by electron beam lithography. The TPSiS resist can resolve 25 nm dense line/space patterns and 16 nm L/4S semidense line/space patterns at a dose of 45 and 85 μC/cm2 for negative-tone development (NTD). The etching selectivity of the TPSiS resist to Si substrate is 8.6 under SF6/O2 plasma, indicating a potential application. Contrast analysis suggests that the significant solubility switch within a narrow exposure dose range (18-47 μC/cm2) by NTD is favorable for high-resolution patterns. This study supplies useful guidelines for the optimization and development of single-component molecular glass resists with high lithographic performance." @default.
- W4328050489 created "2023-03-22" @default.
- W4328050489 creator A5022467053 @default.
- W4328050489 creator A5027096736 @default.
- W4328050489 creator A5033086409 @default.
- W4328050489 creator A5036612366 @default.
- W4328050489 creator A5042951671 @default.
- W4328050489 creator A5048465986 @default.
- W4328050489 creator A5053542067 @default.
- W4328050489 creator A5057774464 @default.
- W4328050489 creator A5075435414 @default.
- W4328050489 date "2023-03-21" @default.
- W4328050489 modified "2023-10-08" @default.
- W4328050489 title "A Single-Component Molecular Glass Resist Based on Tetraphenylsilane Derivatives for Electron Beam Lithography" @default.
- W4328050489 cites W1966150059 @default.
- W4328050489 cites W1980604903 @default.
- W4328050489 cites W1986227194 @default.
- W4328050489 cites W1989994023 @default.
- W4328050489 cites W1994584923 @default.
- W4328050489 cites W2004842271 @default.
- W4328050489 cites W2009061059 @default.
- W4328050489 cites W2011677790 @default.
- W4328050489 cites W2012907465 @default.
- W4328050489 cites W2013446260 @default.
- W4328050489 cites W2017917426 @default.
- W4328050489 cites W2021203328 @default.
- W4328050489 cites W2021361564 @default.
- W4328050489 cites W2024066292 @default.
- W4328050489 cites W2024307209 @default.
- W4328050489 cites W2032210131 @default.
- W4328050489 cites W2051249584 @default.
- W4328050489 cites W2059268103 @default.
- W4328050489 cites W2059805006 @default.
- W4328050489 cites W2060184048 @default.
- W4328050489 cites W2063424552 @default.
- W4328050489 cites W2068951286 @default.
- W4328050489 cites W2069948950 @default.
- W4328050489 cites W2070036575 @default.
- W4328050489 cites W2078494674 @default.
- W4328050489 cites W2089264609 @default.
- W4328050489 cites W2089486737 @default.
- W4328050489 cites W2092400991 @default.
- W4328050489 cites W2144154771 @default.
- W4328050489 cites W2146322716 @default.
- W4328050489 cites W2327086519 @default.
- W4328050489 cites W2598208220 @default.
- W4328050489 cites W2631295260 @default.
- W4328050489 cites W2764360686 @default.
- W4328050489 cites W2800242714 @default.
- W4328050489 cites W2805362213 @default.
- W4328050489 cites W2809190331 @default.
- W4328050489 cites W2913717151 @default.
- W4328050489 cites W2916450938 @default.
- W4328050489 cites W2985491399 @default.
- W4328050489 cites W3014744821 @default.
- W4328050489 cites W3049550538 @default.
- W4328050489 cites W3107017040 @default.
- W4328050489 cites W3118643806 @default.
- W4328050489 cites W3155077869 @default.
- W4328050489 cites W3200427911 @default.
- W4328050489 cites W3209257846 @default.
- W4328050489 cites W4210920555 @default.
- W4328050489 cites W4225161554 @default.
- W4328050489 cites W4282037430 @default.
- W4328050489 cites W4285260026 @default.
- W4328050489 cites W4285595570 @default.
- W4328050489 cites W4288051215 @default.
- W4328050489 cites W4290960440 @default.
- W4328050489 cites W4294920545 @default.
- W4328050489 cites W4296376761 @default.
- W4328050489 cites W4313277410 @default.
- W4328050489 doi "https://doi.org/10.1021/acsomega.2c08112" @default.
- W4328050489 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/37033792" @default.
- W4328050489 hasPublicationYear "2023" @default.
- W4328050489 type Work @default.
- W4328050489 citedByCount "1" @default.
- W4328050489 countsByYear W43280504892023 @default.
- W4328050489 crossrefType "journal-article" @default.
- W4328050489 hasAuthorship W4328050489A5022467053 @default.
- W4328050489 hasAuthorship W4328050489A5027096736 @default.
- W4328050489 hasAuthorship W4328050489A5033086409 @default.
- W4328050489 hasAuthorship W4328050489A5036612366 @default.
- W4328050489 hasAuthorship W4328050489A5042951671 @default.
- W4328050489 hasAuthorship W4328050489A5048465986 @default.
- W4328050489 hasAuthorship W4328050489A5053542067 @default.
- W4328050489 hasAuthorship W4328050489A5057774464 @default.
- W4328050489 hasAuthorship W4328050489A5075435414 @default.
- W4328050489 hasBestOaLocation W43280504891 @default.
- W4328050489 hasConcept C100460472 @default.
- W4328050489 hasConcept C105487726 @default.
- W4328050489 hasConcept C113196181 @default.
- W4328050489 hasConcept C134406635 @default.
- W4328050489 hasConcept C171250308 @default.
- W4328050489 hasConcept C178790620 @default.
- W4328050489 hasConcept C185592680 @default.
- W4328050489 hasConcept C192562407 @default.
- W4328050489 hasConcept C200274948 @default.
- W4328050489 hasConcept C204223013 @default.