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- W4362602402 abstract "Atomically thin 2D van der Waals semiconductors are promising candidate materials for post-silicon electronics. However, it remains challenging to attain completely uniform monolayer semiconductor wafers free of over-grown islands. Here, the observation of the energy-funneling effect and ambient photodelamination phenomenon in inhomogeneous few-layer WS2 flakes under low-illumination fluencies down to several nW µm-2 and its potential as a noninvasive atomic-layer etching strategy for selectively stripping the local excessive overlying islands are reported. Photoluminescent tracking on the photoetching traces reveals relatively fast etching rates of around 0.3-0.8 µm min-1 at varied temperatures and an activation energy of 1.7 eV. By using crystallographic and electronic characterization, the noninvasive nature of the low-power photodelamination and the highly preserved lattice quality are also confirmed in the as-etched monolayer products, featuring a comparable density of atomic defects (≈4.2 × 1013 cm-2 ) to pristine flakes and a high electron mobility of up to 80 cm2 V-1 s-1 at room temperature. This approach opens a noninvasive postetching route for thickness uniformity management in 2D van der Waals semiconductor wafers for electronic applications." @default.
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- W4362602402 date "2023-04-29" @default.
- W4362602402 modified "2023-10-17" @default.
- W4362602402 title "Noninvasive Photodelamination of van der Waals Semiconductors for High‐Performance Electronics" @default.
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- W4362602402 doi "https://doi.org/10.1002/adma.202300618" @default.
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