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- W4367307908 abstract "In advanced semiconductor memory manufacturing, the feature size keeps aggressively shrinking, creating problems in the fabrication process and leading to decreasing yield. Three key factors that can impact memory process and yield are lithographic process window, full field CD uniformity (CDU), and correction run time performance. In this paper, we describe and present a mask processing technique utilizing a) global array detect (GAD) for detecting and optimizing cell repetition, b) periodic boundary condition (PBC) for preserving simulation and mask symmetry, and c) cell-level ILT (CLILT) flow to process repeated cell regions and blend various design parts. With GAD + PBC + CL-ILT processing, we can achieve a perfectly consistent mask array region with enlarged process window and minimum local CD variation for a full field mask. Moreover, with fewer pattern units (called templates) to process, we can complete full chip ILT with reasonable time and compute resources compared to OPC full chip correction. In this paper, we show simulation and wafer print results including pattern fidelity, process window, mask consistency, and run time data." @default.
- W4367307908 created "2023-04-29" @default.
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- W4367307908 date "2023-04-28" @default.
- W4367307908 modified "2023-09-27" @default.
- W4367307908 title "Full chip inverse lithography technology mask synthesis for advanced memory manufacturing" @default.
- W4367307908 doi "https://doi.org/10.1117/12.2657538" @default.
- W4367307908 hasPublicationYear "2023" @default.
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