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- W437041311 abstract "Relative initial adsorption probabilities of O2 molecules on Si(001) surfaces at room temperature and Si18O desorption yield at a surface temperature region from 900 K to 1300 K have been measured as a function of O2 incident energy up to 3.3 eV. Although the adsorption probability showed the minimum at 0.3 eV and to be constant at incident energy over 1 eV, the SiO desorption yield at surface temperatures over 1000 K increased with increasing the incident energy due to the induced-oxidation at silicon dimer bridge sites, their backbond sites and subsurface backbond sites, and the variation of angular distribution of SiO desorption caused by the induced-oxidation." @default.
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- W437041311 date "2002-01-01" @default.
- W437041311 modified "2023-09-24" @default.
- W437041311 title "Influence of Kinetic Energy for Initial Adsorption Probability of O2 Molecules on Si(001) Surfaces and SiO Desorption Yield." @default.
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- W437041311 doi "https://doi.org/10.1380/jsssj.23.519" @default.
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