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• W4376276044 abstract "Abstract Using radio-frequency (rf) sputtering technique tungsten oxide (WO 3 ) thin films (∼150 nm) were deposited in a gas mixture of Ar and O 2 at 10 mTorr pressure on indium tin oxide (ITO) and corning glass substrates. The films were annealed at 400 °C. Structural and optical properties of films were studied. Metal–insulator–metal (MIM) structure was made by depositing metal electrode (Ag, Al, Au) on the prepared WO 3 thin films (on ITO substrate) using thermal evaporation technique. Electrical properties of the MIM structure were studied by plotting current versus voltage ( I – V ) curves for Ag, Al and Au metal electrodes. Current conduction mechanism in WO 3 film was determined by plotting and fitting I – V data in different equations of current mechanisms." @default.
• W4376276044 created "2023-05-13" @default.
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• W4376276044 date "2023-05-15" @default.
• W4376276044 modified "2023-10-01" @default.
• W4376276044 title "Impact of top metal electrodes on current conduction in WO₃ thin films" @default.
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• W4376276044 doi "https://doi.org/10.1515/ijmr-2021-8723" @default.
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