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- W4380996949 abstract "Development of ALD processes with inherent selectivity is the most straightforward approach for self-aligned AS-ALD where the ALD process itself leads to immediate nucleation on certain substrate materials while long nucleation delays on others." @default.
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- W4380996949 date "2023-01-01" @default.
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- W4380996949 title "Inherent area-selective atomic layer deposition of ZnS" @default.
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