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• W4381251649 abstract "Photonic integrated circuits require photodetectors that operate at room temperature with sensitivity at telecom wavelengths and are suitable for integration with planar complementary-metal-oxide-semiconductor (CMOS) technology. Silicon hyperdoped with deep-level impurities is a promising material for silicon infrared detectors because of its strong room-temperature photoresponse in the short-wavelength infrared region caused by the creation of an impurity band within the silicon band gap. In this work, we present the first experimental demonstration of lateral Te-hyperdoped Si PIN photodetectors operating at room temperature in the optical telecom bands. We provide a detailed description of the fabrication process, working principle, and performance of the photodiodes, including their key figure of merits. Our results are promising for the integration of active and passive photonic elements on a single Si chip, leveraging the advantages of planar CMOS technology." @default.
• W4381251649 created "2023-06-20" @default.
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• W4381251649 date "2023-07-25" @default.
• W4381251649 modified "2023-09-26" @default.
• W4381251649 title "On-chip lateral Si:Te PIN photodiodes for room-temperature detection in the telecom optical wavelength bands" @default.
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• W4381251649 doi "https://doi.org/10.1364/oe.494463" @default.
• W4381251649 hasPubMedId "https://pubmed.ncbi.nlm.nih.gov/37710506" @default.
• W4381251649 hasPublicationYear "2023" @default.
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