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- W4382022505 abstract "In this study, 5-aminotetrazole (ATRA) was characterized as a corrosion inhibitor in a phosphate electrolyte for Cu electrochemical mechanical planarization (ECMP). The D.C. and A.C. electrochemical results revealed that ATRA can inhibit Cu surface against dissolution more effectively compared to benzotriazole (BTA). A potential window (~ 0.4 V) within which the planarization efficiency and the Cu removal rate were greater than 70% and 600 nm min-1, respectively, was obtained. It was also found that ATRA stood up lengthwise on the Cu surface, thus resulting in the formation of dense possible polymer film. Consequently, the enhanced passivation capability of ATRA could be attributed to the dense possible polymer film. The ECMP polishing results also presented that a step height reduction of ~800 nm can be achieved at such high potential of 0.7 V vs. Ag/AgCl for only 60 s while 0.01 M ATRA was employed." @default.
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- W4382022505 date "2012-04-01" @default.
- W4382022505 modified "2023-09-25" @default.
- W4382022505 title "5-Aminotetrazole as a Corrosion Inhibitor in a Phosphate Cu ECMP Electrolyte" @default.
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- W4382022505 doi "https://doi.org/10.1016/s1452-3981(23)13974-5" @default.
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