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- W4384702135 abstract "Excessively reducing gate length leads to an increase in off-state current (IOFF) due to severed short-channel effects (SCEs). 3D device architectures such as FinFETs, gate-all-around (GAA) FETs, and U-shaped channel FETs (UFETs), have been proposed in efforts to minimize the SCEs. However, increasing IOFF due to gate leakage and junction leakage is difficult to avoid. In this context, a device optimization of modern UFETs is proposed to suppress the unwanted IOFF. 3-dimensional (3-D) numerical simulations were performed to investigate the origins of the leakage current in UFETs." @default.
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- W4384702135 date "2023-06-30" @default.
- W4384702135 modified "2023-09-26" @default.
- W4384702135 title "Device Optimization for Short-channel Effects Suppression in UFETs" @default.
- W4384702135 doi "https://doi.org/10.5573/jsts.2023.23.3.183" @default.
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