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- W4385079223 abstract "In this study, we fabricated 12 nm-thick <tex xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>$mathbf{Hf}_{0.5}mathbf{Zr}_{0.5}mathbf{O}_{2}(mathbf{HZO})/mathbf{HfO}_{2}-mathbf{ZrO}_{2}$</tex> superlattice (SL-HZO) ferroelectric FinFET (Fe-FinFET) with <tex xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>$mathbf{SiO}_{2}/mathbf{AlON}$</tex> interfacial layers (IL) for comparison. Compared to conventional HZO, SL-HZO Fe-FinFET shows a larger memory window (MW). Meanwhile, the AION-based device owns lower operation voltage due to a more significant voltage drop across the FE layer. Overall, SL-HZO Fe-FinFET with AION IL unleashes the potential of FeFET memory, enabling both low power consumption and a large MW." @default.
- W4385079223 created "2023-07-23" @default.
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- W4385079223 date "2023-06-11" @default.
- W4385079223 modified "2023-09-24" @default.
- W4385079223 title "Investigation of HfO2/ZrO2 Superlattice Dielectric and High-k AION Interfacial Layer on Ferroelectric FinFET" @default.
- W4385079223 doi "https://doi.org/10.23919/snw57900.2023.10183920" @default.
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