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- W4385192496 abstract "For the first time, non-volatile antiferroelectric FETs (NVAFeFETs) with a metal-AFe-metal-insulator-semiconductor (MFMIS) structure are realized employing a replaced floating gate (FG), showing ultrahigh endurance over $2 times 10 ^{9}$ cycles. A device with channel length L <inf xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>CH</inf> of 41 nm achieves a memory window of 1.8 V. These are made possible through a comprehensive understanding of work function (WF)-engineered NV-AFe capacitors having various metals of Al, Pd, and Pt, including the first study of their temperature-dependent characteristics. The promise of our NV-AFeFETs and WF engineering is further highlighted by co-integrating synapses (NVAFeFETs) and neurons (volatile-AFeFETs) using the same device architecture to enable hardware-implemented neuromorphic computing." @default.
- W4385192496 created "2023-07-25" @default.
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- W4385192496 date "2023-06-11" @default.
- W4385192496 modified "2023-09-24" @default.
- W4385192496 title "First Demonstration of Work Function-Engineered BEOL-Compatible IGZO Non-Volatile MFMIS AFeFETs and Their Co-Integration with Volatile-AFeFETs" @default.
- W4385192496 doi "https://doi.org/10.23919/vlsitechnologyandcir57934.2023.10185355" @default.
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