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- W4385293744 abstract "Abstract Deposition of silicon films through seeding of disilane molecules in a supersonic beam of molecular hydrogen is modeled using the direct simulation Monte Carlo technique. In this process, the beam is formed by rapid expansion of the heated gas through an orifice of diameter 250 μm and then through a skimmer. Application of the numerical method to model the gas dynamics of this process is discussed with reference to a number of simulation issues. Description is made of a parallelized implementation of the Monte Carlo method that enables computation of these geometrically complex, nonequilibrium flows. Results are presented for a representative system configuration. General features of the flow field are described. Detailed information is provided by the simulations on the properties of the disilane molecules as they impact at hyperthermal energies on the substrate surface. Comparison of the numerical results with available experimental data reveals good agreement offering the potential to optimize the deposition process using the Monte Carlo method as a design tool." @default.
- W4385293744 created "2023-07-28" @default.
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- W4385293744 date "1996-11-17" @default.
- W4385293744 modified "2023-09-23" @default.
- W4385293744 title "Computation of Supersonic Flow for Thin Film Deposition Using Expansion Through a Skimmer" @default.
- W4385293744 doi "https://doi.org/10.1115/imece1996-1349" @default.
- W4385293744 hasPublicationYear "1996" @default.
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