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- W4385315529 abstract "We describe a wafer level fabrication process for evacuated Rb vapor cells. By etching channels on the wafer surface around the cell positions, we demonstrate wafers of cells with residual gas pressures below 5 mbar." @default.
- W4385315529 created "2023-07-28" @default.
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- W4385315529 date "2023-01-01" @default.
- W4385315529 modified "2023-10-16" @default.
- W4385315529 title "Wafer Level Fabrication of Evacuated Alkali Vapor Cells" @default.
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- W4385315529 doi "https://doi.org/10.1364/cleo_at.2023.jtu2a.46" @default.
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