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- W4385756134 abstract "This work presents exhaustive TCAD investigation of Step-Oxide- Dual Material Gate with Asymmetric Doping engineering on lateral $beta-Ga_{2}O_{3}$ MOSFET. The objective of this work is to achieve high frequency performance. Several device attributes such as output and transfer characteristics, transconductance, parasitic capacitances and cut-off frequency etc., have been studied. Further, various critical figure of merits such as transconductance frequency product, gain bandwidth product etc., have also been obtained. A comparison of the proposed device is drawn with the conventional device. The results highlight that the proposed device is a promising design strategy for RF applications." @default.
- W4385756134 created "2023-08-12" @default.
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- W4385756134 date "2023-07-03" @default.
- W4385756134 modified "2023-09-27" @default.
- W4385756134 title "TCAD Investigation of Step-Oxide and Asymmetric Doping Design with Electrode Engineering on Lateral β-Ga<sub>2</sub>O<sub>3</sub> MOSFET for Terahertz Applications" @default.
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- W4385756134 doi "https://doi.org/10.1109/laedc58183.2023.10209136" @default.
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