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- W4385812148 abstract "This presentation focuses on semiconductor wafer cleaning technology, one of the most critical technologies in semiconductor device manufacturing for obtaining high yield and reliability, and discusses the past, present, and future of the technology. Emphasis is placed on the review of contamination control and cleaning technologies in the early days since the invention of the transistor. To celebrate the 30+1-year anniversary of the UCPSS, a review will be given of both the first conference held in Leuven in 1992 and the second one held in Bruges in 1994. There will be more research challenges and business opportunities in environmentally benign, innovative damage-free wafer cleaning and surface preparation technologies for future applications." @default.
- W4385812148 created "2023-08-15" @default.
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- W4385812148 date "2023-08-14" @default.
- W4385812148 modified "2023-10-02" @default.
- W4385812148 title "Past, Present, and Future of Semiconductor Cleaning Technology" @default.
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- W4385812148 doi "https://doi.org/10.4028/p-il7c5e" @default.
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