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- W4386071716 abstract "In 2019, extreme ultraviolet (EUV) lithography has been applied to high volume manufacturing (HVM). With recent rapid progress on the source power improvement, and EUV lithography development including photoresist materials has been achieved HVM requirements. However, the performance of EUV resist materials are still not enough for the expected HVM requirements. The critical point is the stochastic issues, which will be become ‘detectivity’, like a nano-bridge or a nano-pinching. 2 (two) major stochastic issues, which are photon stochastic and chemical stochastic, were observed in the lithography steps. And the improvement status of each stochastic issues including lithographic results are described." @default.
- W4386071716 created "2023-08-23" @default.
- W4386071716 creator A5000214180 @default.
- W4386071716 date "2023-06-26" @default.
- W4386071716 modified "2023-09-27" @default.
- W4386071716 title "Recent Progress of EUV Resist Development for Improving Chemical Stochastic" @default.
- W4386071716 doi "https://doi.org/10.1109/cstic58779.2023.10219290" @default.
- W4386071716 hasPublicationYear "2023" @default.
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