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- W4386071928 abstract "Reliability risk is considered as the bottleneck in high performance ICs, especially for automotive application. One of the major concerns for reliability comes from the lack of enough EM (electro-migration) resistance. DFR (Design for reliability) is an effective way to approach better reliability performance. In this paper, structures with different reservoir layouts are used in EM test to demonstrate the mechanism of reservoir. Longer EM TTF (time-to-failure) can be achieved by adding reservoir part to provide metal ions to postpone the time that resistance increase reaches failure criterion, and TTF improvement is related to the area of reservoir." @default.
- W4386071928 created "2023-08-23" @default.
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- W4386071928 date "2023-06-26" @default.
- W4386071928 modified "2023-09-26" @default.
- W4386071928 title "Reservoir Effect Study On Electro-Migration Behavior of ALCU Interconnects" @default.
- W4386071928 cites W2016006114 @default.
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- W4386071928 doi "https://doi.org/10.1109/cstic58779.2023.10219311" @default.
- W4386071928 hasPublicationYear "2023" @default.
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