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- W4386489877 abstract "2021 International Conference on Solid State Devices and Materials , <em>In-situ </em> Deposited HfO<sub>2 </sub>and Y<sub>2</sub>O<sub>3</sub> on <em>Epi</em>-Si/p-Ge – a Comparative Study of the Interfacial Properties" @default.
- W4386489877 created "2023-09-07" @default.
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- W4386489877 date "2021-09-08" @default.
- W4386489877 modified "2023-09-28" @default.
- W4386489877 title "<em>In-situ </em> Deposited HfO<sub>2 </sub>and Y<sub>2</sub>O<sub>3</sub> on <em>Epi</em>-Si/p-Ge – a Comparative Study of the Interfacial Properties" @default.
- W4386489877 doi "https://doi.org/10.7567/ssdm.2021.a-4-07" @default.
- W4386489877 hasPublicationYear "2021" @default.
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