Matches in SemOpenAlex for { <https://semopenalex.org/work/W4386574259> ?p ?o ?g. }
Showing items 1 to 95 of
95
with 100 items per page.
- W4386574259 endingPage "112087" @default.
- W4386574259 startingPage "112087" @default.
- W4386574259 abstract "The continuous advancement of CMOS technology has put forward higher requirements for dielectric etching processes. However, conventional mixed etching gases fail to elucidate the contribution of each gas. The role of single etching gas in the etching process remains elusive. In this work, we investigated the etching characteristics of high-κ thin films using a variety of single fluorine-based or chlorine-based gases. We further analyzed the underlying reasons for the observed differences in etching behaviors with different gases. Our findings demonstrate that BCl3 is the optimal single etching gas for HfO2 and Al2O3 films with a fast and stable etching rate, while the films etched by Cl2, BCl3, CF4, CHF3, and C4F8 exhibited varying degrees of etching residuals. The outstanding etching performance of BCl3 is attributed to the interaction between physical bombardment and chemical reactions. Furthermore, we propose a set of evaluation methods for etching residues and mechanisms. These results provide valuable insights into the etching process and facilitate the selection of appropriate etching gases for high-κ films in advanced semiconductor process nodes." @default.
- W4386574259 created "2023-09-10" @default.
- W4386574259 creator A5009113901 @default.
- W4386574259 creator A5020190997 @default.
- W4386574259 creator A5022387395 @default.
- W4386574259 creator A5026079392 @default.
- W4386574259 creator A5026226602 @default.
- W4386574259 creator A5038836690 @default.
- W4386574259 creator A5066219206 @default.
- W4386574259 creator A5075163666 @default.
- W4386574259 creator A5085245429 @default.
- W4386574259 date "2023-10-01" @default.
- W4386574259 modified "2023-10-01" @default.
- W4386574259 title "Evaluation of etching performance of single etching gases for high-κ films" @default.
- W4386574259 cites W1496024054 @default.
- W4386574259 cites W1505695052 @default.
- W4386574259 cites W1565311360 @default.
- W4386574259 cites W1616717154 @default.
- W4386574259 cites W1662428887 @default.
- W4386574259 cites W1680662765 @default.
- W4386574259 cites W2014357248 @default.
- W4386574259 cites W2068888098 @default.
- W4386574259 cites W2069519700 @default.
- W4386574259 cites W2070058744 @default.
- W4386574259 cites W2092583538 @default.
- W4386574259 cites W2099791538 @default.
- W4386574259 cites W2145633302 @default.
- W4386574259 cites W2152118393 @default.
- W4386574259 cites W2967396727 @default.
- W4386574259 cites W3161143485 @default.
- W4386574259 cites W3179962452 @default.
- W4386574259 cites W4290949619 @default.
- W4386574259 doi "https://doi.org/10.1016/j.mee.2023.112087" @default.
- W4386574259 hasPublicationYear "2023" @default.
- W4386574259 type Work @default.
- W4386574259 citedByCount "0" @default.
- W4386574259 crossrefType "journal-article" @default.
- W4386574259 hasAuthorship W4386574259A5009113901 @default.
- W4386574259 hasAuthorship W4386574259A5020190997 @default.
- W4386574259 hasAuthorship W4386574259A5022387395 @default.
- W4386574259 hasAuthorship W4386574259A5026079392 @default.
- W4386574259 hasAuthorship W4386574259A5026226602 @default.
- W4386574259 hasAuthorship W4386574259A5038836690 @default.
- W4386574259 hasAuthorship W4386574259A5066219206 @default.
- W4386574259 hasAuthorship W4386574259A5075163666 @default.
- W4386574259 hasAuthorship W4386574259A5085245429 @default.
- W4386574259 hasConcept C100460472 @default.
- W4386574259 hasConcept C1291036 @default.
- W4386574259 hasConcept C130472188 @default.
- W4386574259 hasConcept C133386390 @default.
- W4386574259 hasConcept C136525101 @default.
- W4386574259 hasConcept C142724271 @default.
- W4386574259 hasConcept C171250308 @default.
- W4386574259 hasConcept C185592680 @default.
- W4386574259 hasConcept C192562407 @default.
- W4386574259 hasConcept C204787440 @default.
- W4386574259 hasConcept C2779227376 @default.
- W4386574259 hasConcept C33220542 @default.
- W4386574259 hasConcept C37977207 @default.
- W4386574259 hasConcept C49040817 @default.
- W4386574259 hasConcept C71924100 @default.
- W4386574259 hasConceptScore W4386574259C100460472 @default.
- W4386574259 hasConceptScore W4386574259C1291036 @default.
- W4386574259 hasConceptScore W4386574259C130472188 @default.
- W4386574259 hasConceptScore W4386574259C133386390 @default.
- W4386574259 hasConceptScore W4386574259C136525101 @default.
- W4386574259 hasConceptScore W4386574259C142724271 @default.
- W4386574259 hasConceptScore W4386574259C171250308 @default.
- W4386574259 hasConceptScore W4386574259C185592680 @default.
- W4386574259 hasConceptScore W4386574259C192562407 @default.
- W4386574259 hasConceptScore W4386574259C204787440 @default.
- W4386574259 hasConceptScore W4386574259C2779227376 @default.
- W4386574259 hasConceptScore W4386574259C33220542 @default.
- W4386574259 hasConceptScore W4386574259C37977207 @default.
- W4386574259 hasConceptScore W4386574259C49040817 @default.
- W4386574259 hasConceptScore W4386574259C71924100 @default.
- W4386574259 hasLocation W43865742591 @default.
- W4386574259 hasOpenAccess W4386574259 @default.
- W4386574259 hasPrimaryLocation W43865742591 @default.
- W4386574259 hasRelatedWork W1598917330 @default.
- W4386574259 hasRelatedWork W1942645863 @default.
- W4386574259 hasRelatedWork W1990364189 @default.
- W4386574259 hasRelatedWork W1999955672 @default.
- W4386574259 hasRelatedWork W2014359839 @default.
- W4386574259 hasRelatedWork W2014742672 @default.
- W4386574259 hasRelatedWork W2031418563 @default.
- W4386574259 hasRelatedWork W2066582065 @default.
- W4386574259 hasRelatedWork W2361443341 @default.
- W4386574259 hasRelatedWork W2377694526 @default.
- W4386574259 hasVolume "282" @default.
- W4386574259 isParatext "false" @default.
- W4386574259 isRetracted "false" @default.
- W4386574259 workType "article" @default.