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- W4386783880 abstract "To avoid the interlayer erosion challenge in the IJP process and direct patterning process of the QD emissive layer (EML), cross-linking strategies have been introduced to construct solvent-resistant films (hole transport layers or QD EMLs) upon exposure to heat or light." @default.
- W4386783880 created "2023-09-16" @default.
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- W4386783880 date "2023-01-01" @default.
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- W4386783880 title "Cross-linking strategies for hole transport/emissive layers in quantum-dot light-emitting diodes" @default.
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- W4386783880 doi "https://doi.org/10.1039/d3qm00831b" @default.
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