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- W4387246134 abstract "Abstract V1-xTixO2 (VTO) thin films were fabricated on Si3N4/SiO2/Si substrate by fabricating VO2/TiO2 using carbon thermal reduction metal-organic decomposition (MOD). The V0.65Ti0.35O2 thin films exhibited the suppressed resistance-temperature (R-T) characteristic, showed no metal-insulator transition (MIT) during temperature (10~90 ºC), but the temperature coefficient of resistance was high (TCR = -4.24 %/K). The DC sensitivity of the VTO bolometer was 434 W-1. Then, VTO thin films on Si3N4/SiO2 membranes were realized by CF4+O2 (95%+5%) plasma etching at 200 W for 5 min, followed by wet etching of the backside of the substrates, using KOH solution (20% by weight) at 60 ºC for 8 hrs. VTO thin films on Si3N4/SiO2 membranes had a high DC sensitivity of 9876 W-1, which was 20 times higher than the film on Si3N4/SiO2/Si substrate." @default.
- W4387246134 created "2023-10-03" @default.
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- W4387246134 date "2023-10-02" @default.
- W4387246134 modified "2023-10-03" @default.
- W4387246134 title "Fabrication of V<sub>1-x</sub>Ti<sub>x</sub>O<sub>2</sub> microbolometers on Si<sub>3</sub>N<sub>4</sub>/SiO<sub>2</sub> membranes" @default.
- W4387246134 doi "https://doi.org/10.35848/1347-4065/acfefa" @default.
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