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- W4387667079 endingPage "111606" @default.
- W4387667079 startingPage "111606" @default.
- W4387667079 abstract "The peculiar oxidation behavior of Zr0.5Hf0.5NiSn0.985Sb0.015 (ZHNS) under different temperatures has been investigated. ZHNS presents thermal inert at 823K-1073K, but shows large oxidation rate at 723K-773K. The thermodynamic and kinetic analyses reveal that, dense oxidation layer (DOL, composed of ZrO2, HfO2 and Ni3Sn2) is preferentially generated at high temperatures and/or low oxygen pressures, while alternative layers of (ZrO2, HfO2, SnO2)/Ni3Sn2 with abundant cracks at lower temperatures. By pre-oxidization at 873 K in Ar flow, an artificial DOL oxidation-protective coating is fabricated. With this coating, the single-leg thermoelectric device demonstrates excellent stability in air at temperature gradient of 778 K/300 K for 15 days." @default.
- W4387667079 created "2023-10-17" @default.
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- W4387667079 date "2023-10-01" @default.
- W4387667079 modified "2023-10-18" @default.
- W4387667079 title "High temperature oxidation behavior of ZrNiSn-based half-Heusler thermoelectric material" @default.
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- W4387667079 doi "https://doi.org/10.1016/j.corsci.2023.111606" @default.
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