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- W44058746 abstract "This chapter discusses how properties of ferromagnetic sputtering targets are controlled using design concepts and metallurgical thermomechanical processing steps. Properties of magnetic films are also discussed in light of applications such as silicide films for integrated circuits and magnetic data storage media (longitudinal and perpendicular). Prior to these discussions, a general introduction to magnetic materials is presented, which includes an overview of the basics of magnetism and classification of magnetic materials. Readers are encouraged to refer Chapter 1 where technology trends and attributes of various commercial sputter tools have been reviewed." @default.
- W44058746 created "2016-06-24" @default.
- W44058746 creator A5003799817 @default.
- W44058746 date "2014-01-01" @default.
- W44058746 modified "2023-09-25" @default.
- W44058746 title "Ferromagnetic Sputtering Targets and Thin Films for Silicides and Data Storage" @default.
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- W44058746 doi "https://doi.org/10.1016/b978-0-8155-1593-7.00007-2" @default.
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