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- W44416576 abstract "Deposition of titanium oxide film having Ti/O compositionally gradient layer onto titanium-based alloy such as Ti-6Al-4V was carried out by reactive DC sputtering, in order to improve not only the biocompatibility of the alloy but also the adhesion at the interface between the deposited titanium oxide film and the alloy substrate with preserving the high hardness and the passivity of the titanium oxide film. The effects of Ti/O compositional gradient on adhesion of the film at the interface to the alloy substrate were investigated by comparing the adhesion of Ti-O compositionally gradient films at the interface boundary with that of Ti-O compositionally constant films at the interface. The compositional gradient was realized by varying continuously the oxygen content in Ar-O2 sputter gas mixture during the sputter-deposition. According to AES in-depth profiles, the oxygen(O) concentration in the deposited film decreased gradually in-depth direction from the surface toward the substrate, confirming that a film with Ti/O compositional gradient, i.e., a Ti-O compositionally gradient film had formed on the alloy substrate, and thereby expecting that the stress concentrated at the interface between the deposited film and the alloy substrate could be relaxed. On the basis of indentation-fracture tests, it was found the compositionally gradient film had more adhesion at the interface than the compositionally constant film, concluding that the Ti/O compositional gradient layer improved the adhesion of the deposited titanium oxide film." @default.
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- W44416576 date "2006-01-01" @default.
- W44416576 modified "2023-10-16" @default.
- W44416576 title "Improved adhesion of titanium oxide film to titanium-base alloy by Ti/O compositional gradient using reactive sputter-deposition" @default.
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- W44416576 doi "https://doi.org/10.1016/b978-044452224-5/50061-5" @default.
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