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• W50759852 abstract "Publisher Summary This chapter deals with the explanation of techniques and tools for optical lithography. The image field of a step and repeat projection aligner or of a stepping and scanning projection aligner generally is much smaller than the wafer on which the pattern is transferred. These aligners expose a field on the wafer, then step to the next specified site on the wafer and repeat the operation. This chapter discusses the printing tools and their usage in the IC manufacturing world. A technical discussion of optical steppers deals with image quality and image placement. Image quality is concerned with the dimensional control of features of a desired size. Metal oxide semiconductor scaling rules generally maintain that final patterned linewidths, that is controlled within 10% of the nominal feature size and the accuracy of the placement of features should be within 20–25% of the minimum feature size. Optical lithography is the backbone and mainstay of the world's microchip production activity. In the optical arena, it is found that 1–5X reduction printers of the projection scanned and unscanned variety, is described in subsets according to coherent and noncoherent radiation, as well as by wavelengths ranging from visible to deep ultraviolet (UV), then extending to angstrom levels. Higher resolution or more energetic sourced tools are also well described." @default.
• W50759852 created "2016-06-24" @default.
• W50759852 creator A5089065671 @default.
• W50759852 date "1991-01-01" @default.
• W50759852 modified "2023-09-27" @default.
• W50759852 title "TECHNIQUES AND TOOLS FOR OPTICAL LITHOGRAPHY" @default.
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