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- W53478220 abstract "The formation of cristobalite in the amorphous silica-glass layer is essential for the oxidation performance of SiC. Electron microscopical examinations of thermal treated ∝- SiC single crystals and polycrystals from the Acheson process showed the influence of the SiC-structure on the formation of silica-glass and cristobalite. The latter influences the diffusion controlled oxidation." @default.
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- W53478220 date "1969-01-01" @default.
- W53478220 modified "2023-09-25" @default.
- W53478220 title "FORMATION OF CRISTOBALITE FROM SILICON CARBIDE" @default.
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- W53478220 doi "https://doi.org/10.1016/b978-0-08-006768-1.50034-6" @default.
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