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- W571093485 abstract "Chapter headings and selected sections: Basic Theory. Pump capacity. Understanding pump behavior. The ideal gas assumptions. Counting molecules (or atoms). Density, pressure and molecular velocities. Vapor pressure. Mean free path. Thermal conductivity of gases. Pumping speed, a convenient abstraction. Throughput. Conductance, another convenient abstraction. Voltage, current and impedance analogies. Dalton's law and linear superposition. Selective and variable pumping speed. Measuring pump speed. System diagnostics with any pump. Electrical discharges in gases. Sputter-Ion Pumping. The penning cell. Pumping speed abstraction. The making of sputter-ion pumps. Diode pumps. Noble gas instabilities. The triode pump. The differential sputtering pump. Hydrogen pumping. Transient speed effects. Pumping gas mixtures. High pressure operation. Pumping elements located in antechambers or pockets. Pump power supplies. Magnet designs. Titanium Sublimation Pumping. Sticking coefficients. Pump speed vs. sticking coefficient . Synthesis, displacement and dissociation of gases. Sublimation sources. Combination pumping. Advantages and disadvantages of TSP pumping. Nonevaporable Getters (NEG). Mechanical features. NEG pumping mechanisms. Advantages and disadvantages of NEGs. Cryopumping. Cryocondensation vs. cryosorption. Sorption roughing pumps. Liquid helium cryopumps. Closed-loop, gaseous helium cryopumps. Closed-loop, gaseous helium refrigerators. Subject Index. Author Index." @default.
- W571093485 created "2016-06-24" @default.
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- W571093485 date "1991-09-30" @default.
- W571093485 modified "2023-09-27" @default.
- W571093485 title "Capture Pumping Technology: An Introduction" @default.
- W571093485 hasPublicationYear "1991" @default.
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