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- W582114561 abstract "Part 1 New trends in electrochemical technology: future perspectives in electrochemical processing and technology, N. Masuko and T. Tsuda high density magnetic recording media prepared by electroless-plating method, T. Osaka and T. Homma metallurgical analysis of mechanical properties of electroless copper deposits, S. Nakahara and Y. Okinaka synthesis of advanced materials byelectrochemical processing by nonaqueous media, D.R. Sadoway. Part 2 New methods of electrochemical approaches: the electrochemical QCM (quartz crystal microbalance) method, W.H. Smyrl and M. Lein multichannel spectroscopic ellipsometry for real time analysis of electrochemical and plasma deposition of thin films, R.W. Collins real-time, submonolayer monitoring of electrochemical processes using acoustic plate mode devices, A.J. Ricco and S.J. MArtin photoacoustic applications to the solid/liquid interface, A. Fujishima and S. Yoshihara in situ scanning tunnelling microscopy of electrode/solution interfaces, K. Itaya microtopography of electrochemical surface layers, R.H. Muller laser interferometry as an in-situ technique to characterize electrochemical processes, Y. Fukunaka et al photocurrent and photopotential transients of n- and p-GaAs and n- and p-InP, W. Plieth et al electrochemical analysis of electrode in plasma and its applications, S. Ito." @default.
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- W582114561 date "1993-03-01" @default.
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- W582114561 title "New Trends and Approaches in Electrochemical Technology" @default.
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