Matches in SemOpenAlex for { <https://semopenalex.org/work/W589621558> ?p ?o ?g. }
Showing items 1 to 87 of
87
with 100 items per page.
- W589621558 abstract "Preface. 1. Introduction to Semiconductor Lithography. 1.1 Basics of IC Fabrication. 1.2 Moore's Law and the Semiconductor Industry. 1.3 Lithography Processing. Problems. 2. Aerial Image Formation - The Basics. 2.1 Mathematical Description of Light. 2.2 Basic Imaging Theory. 2.3 Partial Coherence. 2.4 Some Imaging Examples. Problems. 3. Aerial Image Formation - The Details. 3.1 Aberrations. 3.2 Pupil Filters and Lens Apodization. 3.3 Flare. 3.4 Defocus. 3.5 Imaging with Scanners Versus Steppers. 3.6 Vector Nature of Light. 3.7 Immersion Lithography. 3.8 Image Quality. Problems. 4. Imaging in Resist: Standing Waves and Swing Curves. 4.1 Standing Waves. 4.2 Swing Curves. 4.3 Bottom Antirefl ection Coatings. 4.4 Top Antirefl ection Coatings. 4.5 Contrast Enhancement Layer. 4.6 Impact of the Phase of the Substrate Refl ectance. 4.7 Imaging in Resist. 4.8 Defi ning Intensity. Problems. 5. Conventional Resists: Exposure and Bake Chemistry. 5.1 Exposure. 5.2 Post-Apply Bake. 5.3 Post-exposure Bake Diffusion. 5.4 Detailed Bake Temperature Behavior. 5.5 Measuring the ABC Parameters. Problems. 6. Chemically Amplifi ed Resists: Exposure and Bake Chemistry. 6.1 Exposure Reaction. 6.2 Chemical Amplifi cation. 6.3 Measuring Chemically Amplifi ed Resist Parameters. 6.4 Stochastic Modeling of Resist Chemistry. Problems. 7. Photoresist Development. 7.1 Kinetics of Development. 7.2 The Development Contrast. 7.3 The Development Path. 7.4 Measuring Development Rates. Problems. 8. Lithographic Control in Semiconductor Manufacturing. 8.1 Defi ning Lithographic Quality. 8.2 Critical Dimension Control. 8.3 How to Characterize Critical Dimension Variations. 8.4 Overlay Control. 8.5 The Process Window. 8.6 H-V Bias. 8.7 Mask Error Enhancement Factor (MEEF). 8.8 Line-End Shortening. 8.9 Critical Shape and Edge Placement Errors. 8.10 Pattern Collapse. Problems. 9. Gradient-Based Lithographic Optimization: Using the Normalized Image Log-Slope. 9.1 Lithography as Information Transfer. 9.2 Aerial Image. 9.3 Image in Resist. 9.4 Exposure. 9.5 Post-exposure Bake. 9.6 Develop. 9.7 Resist Profi le Formation. 9.8 Line Edge Roughness. 9.9 Summary. Problems. 10. Resolution Enhancement Technologies. 10.1 Resolution. 10.2 Optical Proximity Correction (OPC). 10.3 Off-Axis Illumination (OAI). 10.4 Phase-Shifting Masks (PSM). 10.5 Natural Resolutions. Problems. Appendix A. Glossary of Microlithographic Terms. Appendix B. Curl, Divergence, Gradient, Laplacian. Appendix C. The Dirac Delta Function. Index." @default.
- W589621558 created "2016-06-24" @default.
- W589621558 creator A5000381998 @default.
- W589621558 date "2007-01-01" @default.
- W589621558 modified "2023-10-02" @default.
- W589621558 title "Fundamental principles of optical lithography : the science of microfabrication" @default.
- W589621558 cites W1853404081 @default.
- W589621558 cites W2015770028 @default.
- W589621558 cites W2025064062 @default.
- W589621558 cites W2038529815 @default.
- W589621558 cites W2038776074 @default.
- W589621558 cites W2040160260 @default.
- W589621558 cites W2108596270 @default.
- W589621558 cites W2150724867 @default.
- W589621558 cites W3203992401 @default.
- W589621558 hasPublicationYear "2007" @default.
- W589621558 type Work @default.
- W589621558 sameAs 589621558 @default.
- W589621558 citedByCount "114" @default.
- W589621558 countsByYear W5896215582012 @default.
- W589621558 countsByYear W5896215582013 @default.
- W589621558 countsByYear W5896215582014 @default.
- W589621558 countsByYear W5896215582015 @default.
- W589621558 countsByYear W5896215582016 @default.
- W589621558 countsByYear W5896215582017 @default.
- W589621558 countsByYear W5896215582018 @default.
- W589621558 countsByYear W5896215582019 @default.
- W589621558 countsByYear W5896215582020 @default.
- W589621558 countsByYear W5896215582021 @default.
- W589621558 countsByYear W5896215582022 @default.
- W589621558 crossrefType "book" @default.
- W589621558 hasAuthorship W589621558A5000381998 @default.
- W589621558 hasConcept C115961682 @default.
- W589621558 hasConcept C120665830 @default.
- W589621558 hasConcept C121332964 @default.
- W589621558 hasConcept C125045340 @default.
- W589621558 hasConcept C134406635 @default.
- W589621558 hasConcept C154945302 @default.
- W589621558 hasConcept C162996421 @default.
- W589621558 hasConcept C171250308 @default.
- W589621558 hasConcept C192562407 @default.
- W589621558 hasConcept C204223013 @default.
- W589621558 hasConcept C2779227376 @default.
- W589621558 hasConcept C41008148 @default.
- W589621558 hasConcept C49040817 @default.
- W589621558 hasConcept C53524968 @default.
- W589621558 hasConceptScore W589621558C115961682 @default.
- W589621558 hasConceptScore W589621558C120665830 @default.
- W589621558 hasConceptScore W589621558C121332964 @default.
- W589621558 hasConceptScore W589621558C125045340 @default.
- W589621558 hasConceptScore W589621558C134406635 @default.
- W589621558 hasConceptScore W589621558C154945302 @default.
- W589621558 hasConceptScore W589621558C162996421 @default.
- W589621558 hasConceptScore W589621558C171250308 @default.
- W589621558 hasConceptScore W589621558C192562407 @default.
- W589621558 hasConceptScore W589621558C204223013 @default.
- W589621558 hasConceptScore W589621558C2779227376 @default.
- W589621558 hasConceptScore W589621558C41008148 @default.
- W589621558 hasConceptScore W589621558C49040817 @default.
- W589621558 hasConceptScore W589621558C53524968 @default.
- W589621558 hasLocation W5896215581 @default.
- W589621558 hasOpenAccess W589621558 @default.
- W589621558 hasPrimaryLocation W5896215581 @default.
- W589621558 hasRelatedWork W1566629850 @default.
- W589621558 hasRelatedWork W1594489858 @default.
- W589621558 hasRelatedWork W1666853924 @default.
- W589621558 hasRelatedWork W1992381963 @default.
- W589621558 hasRelatedWork W2000358180 @default.
- W589621558 hasRelatedWork W2014948129 @default.
- W589621558 hasRelatedWork W2037537680 @default.
- W589621558 hasRelatedWork W2051050853 @default.
- W589621558 hasRelatedWork W2070386132 @default.
- W589621558 hasRelatedWork W2092982423 @default.
- W589621558 hasRelatedWork W2095847028 @default.
- W589621558 hasRelatedWork W2099471712 @default.
- W589621558 hasRelatedWork W2108782500 @default.
- W589621558 hasRelatedWork W2123511121 @default.
- W589621558 hasRelatedWork W2129216969 @default.
- W589621558 hasRelatedWork W2129996279 @default.
- W589621558 hasRelatedWork W2151703212 @default.
- W589621558 hasRelatedWork W2501873590 @default.
- W589621558 hasRelatedWork W2503863107 @default.
- W589621558 hasRelatedWork W592018936 @default.
- W589621558 isParatext "false" @default.
- W589621558 isRetracted "false" @default.
- W589621558 magId "589621558" @default.
- W589621558 workType "book" @default.