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- W615512110 abstract "Part reviews state-of-the-art of thin film diamond a very promising new semiconductor that may one day rival silicon as of choice for electronics. Diamond has following important characteristics: it is resistant to radiation damage, chemically inert and biocompatible, and it will become the material for bio-electronics, in-vivo applications, radiation detectors and high-frequency devices. Thin-Film Diamond II is first book to summarize state-of-the-art of CVD diamond in depth. It covers most recent results regarding growth and structural properties, doping and defect characterization, hydrogen in and on diamond as well as surface properties in general, applications of diamond in electrochemistry, as detectors, and in surface acoustic wave devices." @default.
- W615512110 created "2016-06-24" @default.
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- W615512110 date "2003-01-01" @default.
- W615512110 modified "2023-09-26" @default.
- W615512110 title "Thin-film diamond" @default.
- W615512110 hasPublicationYear "2003" @default.
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