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- W617439770 abstract "Thin films of $CaBi_2Ta_2O_9$ (CBT) were deposited on $Pt/TiO_2/SiO_2/Si$ substrates using the pulsed laser deposition technique at temperatures ranging from 500 to 700°C. The presence of (115) and (00 ) orientations confirm the phase formation at the lower temperature (500°C). Microstructure evolution of CBT films with oxygen pressure of 100-200 mTorr at a substrate temperature of 650°C shows that the films deposited at lower pressure have a relatively smaller grain size and less surface roughness. The films grown at 650°C exhibited a maximum polarization of (2Pm) 17 µC/cm2, remanent polarization of (2Pr) 8 µC/cm2 and coercive field of (Ec) 128 kV/cm, with fatigue endurance up to 1010 switching cycles. The higher dielectric constant (~115 at 100 kHz) with a relatively lower dissipation factor (0.02) at higher growth temperature (700°C) was explained by the increased grain size. The higher leakage current density $(~10^7 A/cm^2)$ at higher deposition temperature is attributed to the interfacial diffusion of the film and the substrate." @default.
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- W617439770 date "2001-05-01" @default.
- W617439770 modified "2023-10-18" @default.
- W617439770 title "$CaBi_2Ta_2O_9$ ferroelectric thin films prepared by pulsed laser deposition" @default.
- W617439770 hasPublicationYear "2001" @default.
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