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- W6284530 abstract "High efficiency crystalline silicon solar cells were fabricated by a combined process of ion implantation and firedthrough techniques. The developed process was characterized by a short-time, high throughput, and low temperature processing. A new ion implanter was developed which featured high ion current, excellent dose uniformity and high speed treating of wafers. The influence of ion implantation energy, dose amount, and firing temperature upon cell characteristics was investigated. A low contact resistance was achieved between the front-contact and silicon by using a silver paste containing metal powder which reacted with SiO/sub 2/ to form silicide and using an AR coating material consisting of titanium and tin complexes. Cell characteristics of the fabricated cell were: Voc=0.57V; Jsc= 29.5mA/cm/sup 2/; FF=0.80; and /eta/=13.5%." @default.
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- W6284530 date "1984-05-01" @default.
- W6284530 modified "2023-09-24" @default.
- W6284530 title "A new process for high efficiency silicon solar cells" @default.
- W6284530 hasPublicationYear "1984" @default.
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