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- W63098570 abstract "Capacitively coupled rf discharges used for materials processing are typically operated at 1-100 mTorr with 50-1000 V applied at 13.56 MHz in a parallel plate chamber. Using PDP1, a 1d3v PIC simulation code, the authors find that an electron beam is generated by the expanding sheath. At low pressure this beam can cross the discharge to interact with the opposite sheath. Depending on the phase of the opposite sheath, the beam may be lost to the electrode or reflected back into the discharge with either a higher or lower energy. This strongly affects the ionization rate and discharge power balance. The phase of the opposite sheath when the electron beam arrives is a sensitive function of the discharge length. By changing the discharge length a resonant effect can be observed in the simulation." @default.
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- W63098570 date "1992-12-01" @default.
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- W63098570 title "Electron beam - sheath interaction in RF discharges" @default.
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