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Matches in SemOpenAlex for { <https://semopenalex.org/work/W638549368> ?p ?o ?g. }

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• W638549368 abstract "We report the first example of a Ni0 precursor that provides a contamination-free (<1%) nickel film by metal–organic chemical vapor deposition (MOCVD) using N2 as the carrier gas. The structure and physical properties of the Ni0 precursor and subsequent film are described." @default.
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• W638549368 date "2015-06-05" @default.
• W638549368 modified "2023-09-27" @default.
• W638549368 title "An N2-compatible Ni0 Metal–Organic Chemical Vapor Deposition (MOCVD) Precursor" @default.
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• W638549368 doi "https://doi.org/10.1246/cl.150155" @default.
• W638549368 hasPublicationYear "2015" @default.
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